Article
Extended Data Fig. 8 | Large-area cross-sectional TEM images, EDS line
prof iles and maps of a Co/a-BN(3 nm)/Si f ilm after thermal diffusion at
600 °C for 60 min. a, Large-area cross-sectional TEM image and EDS line
profiles. b, EDS maps of Co and Si showing that Co is isolated above the a-BN
film and does not diffuse into the Si. c, EDS maps of a magnified area in b.