9.3. METAL-OXIDE-SEMICONDUCTOR CAPACITOR 443
Ec
Ei
EF
Ev
M
O Semiconductor
EF
eVG
W
d
z
Charge density
under inversion
Qm Q (charge per unit area)
Qd: charge from background dopants
Qn: free carrier charge
W
z
Electric
field
Electrostatic
potential
W
z
Es
Eox
z
V(x)
W
V
Vs
VG = Vfb + V
= Vfb + Vox + Vs
Vox
Band profile
under inversion
Metal-insulator
interface
Figure 9.10: A schematic of the distributions of charge, electric field, and electrostatic potential
in the ideal MOS capacitor in inversion.Onceinversionbegins,thedepletionwidthWdoesnot
increasefurtherbecauseofthehighmobileelectrondensityattheinterfaceregion.