9.3. METAL-OXIDE-SEMICONDUCTOR CAPACITOR 443
EcEi
EF
EvMO Semiconductor
EFeVGWdzCharge density
under inversionQm Q (charge per unit area)Qd: charge from background dopantsQn: free carrier chargeW
zElectric
fieldElectrostatic
potentialW
zEsEoxzV(x)WVVsVG = Vfb + V
= Vfb + Vox + VsVoxBand profile
under inversionMetal-insulator
interfaceFigure 9.10: A schematic of the distributions of charge, electric field, and electrostatic potential
in the ideal MOS capacitor in inversion.Onceinversionbegins,thedepletionwidthWdoesnot
increasefurtherbecauseofthehighmobileelectrondensityattheinterfaceregion.