Nitration 131
heating or cooling. Temperature increase during nitration is often associated with an increase
in undesirable by-products (Section 4.3.5). However, many deactivated substrates, particularly
those already containing one or more nitro groups, react only slowly with mixed acid at ambient
temperature.
While nitric acid is generally a good solvent for many organic compounds, the mixed
acids commonly used in nitrations, especially those containing oleum, result in heterogeneous
reactions, meaning that a high stir rate is important for uniform substrate nitration. When
working with mole quantities of substrate a high stir rate also becomes an important safety
point because heterogeneous nitrations containing large portions of unreacted substrate are
susceptible to thermal runaway and the risk of explosion.
Experimentally, the use of mixed acid for the nitration of aromatic substrates is very con-
venient. Reactions are often quenched by the addition of water, where the product usually
precipitates. Solids are simply filtered from the acid liquors and oils are either separated or
extracted into organic solvents. However, on an industrial scale, these mixed acid nitrations
create environmental problems from air and water pollution (Sections 4.3.5 and 4.8.2).
4.3.2 Substrate derived reactivity
4.3.2.1 Phenols and phenol ethers
Phenols and phenol ethers are nitrated with relative ease, and even though the deactivating
effect of the nitro group means that progressive nitration becomes slower and more difficult,
the introduction of three nitro groups into the aromatic ring can be achieved under fairly mild
conditions. However, the direct nitration of substrates containing phenolic groups can be low
yielding because of facile oxidation and the vigour of such reactions. Phenol itself is readily
oxidized to oxalic acid on heating with concentrated nitric acid. The direct nitration of phenol
with mixed acid provides low yields of picric acid along with much resinous matter, the acidic
liquors also containing oxalic acid. With all phenolic substrates, the higher the temperature of
the nitration, the more by-products formed.
OH
SO 3 H
OH OH
NO 2
NO 2
4
O 2 N
OH
SO 3 H
SO 3 H
20
SO 3 H
21
OH
18
- 98 % H 2 SO 4 , 100 °C
2. 70 % HNO 3
66 % (2 steps)
19
Figure 4.5
A commonly used strategy for the higher nitration of phenolic substrates is to sulfonate the
electron-rich aromatic ring before nitration. Sulfonic acid groups are electron withdrawing and