5.1. Semiconductor Detectors 271
Table 5.1.4: Common donor and acceptor elements used to dope silicon. Also given
are their ionization energies (47).
Doping Agent Symbol Type Ionization Energy (eV)Arsenic As Donor 0.054Phosphorus P Donor 0.045Antimony Sb Donor 0.043Aluminum Al Acceptor 0.072Boron B Acceptor 0.045Gallium Ga Acceptor 0.074Indium In Acceptor 0.157and producing the related quantities for use in computations required for detector
development and operation (see Table 5.1.5).
Table 5.1.5: Mobilities (μe,μh,) velocities (ve,vh), and diffusion coefficients (De,Dh)
of electrons and holes in silicon (47).
Property Symbol ValueElectron Mobility μe ≤ 1400 cm^2 V−^1 s−^1Hole Mobility μh ≤ 450 cm^2 V−^1 s−^1Electron Thermal Velocity ve 2. 3 × 105 ms−^1Hole Thermal Velocity vh 1. 65 × 105 ms−^1Electron Diffusion Coefficient De ≤ 36 cm^2 s−^1Hole Diffusion Coefficient Dh ≤ 12 cm^2 s−^1The reader might be wondering as to why in Table 5.1.5 only the upper bounds
on the diffusion coefficient and mobility values have been given in Table 5.1.5. The
reason is that these parameters depend on various factors, such as temperature,
impurity type and concentration, and doping. This can be appreciated by looking
at figures 5.1.11 and 5.1.12, which are the plots of electron and ion mobilities versus
donor density. The plots have two interesting features. One is their non-linearity