Scanning Electron Microscopy and X-Ray Microanalysis

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Secondary electron yield vs. beam energy for copper

Secondary electron coefficient

Moncrieff and Barker (1976)

a 0.8

0.7

0.6

0.5

0.4

0.3

0.2

0.1
0510
Beam energy (keV)

15 20 25 30

Secondary electron yield vs. beam energy for copper

Data of Bongeler et al. (1993)

2.2
2.0
1.8
1.6
1.4
1.2
1.0
0.8
0.6
0.4
01234 5

Secondary electron coefficient

Beam energy (keV)

b

Secondary electron emission vs. beam energy
c 1.8

1.6
Reimer L. and Tolkamp C. (1980), Scanning 3, 35.

Au
Ag
Cu
AI
C

1.4

0.0
0510 15 20 25 30

0.2

0.4

0.6

0.8

1.0

1.2

Secondary electron coefficient

Beam energy (keV)

. Fig. 3.8 a Behavior of the secondary electron coefficient
as a function of incident beam energy for the conventional
beam energy range, E 0 = 5–30 keV (Data of Moncrieff and
Barker ( 1976 )). b Behavior of the secondary electron
coefficient as a function of incident beam energy for the low
beam energy range, E 0 < 5 keV (data) (Data of Bongeler et al.
( 1993 )). c Dependence of the secondary electron coefficient
on incident beam energy for C, Al, Cu, Ag, and Au (Reimer
and Tolkamp 1980 )


Chapter 3 · Secondary Electrons
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