Scanning Electron Microscopy and X-Ray Microanalysis

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4


. Fig. 4.15 a Monte Carlo simulation (DTSA-II)
of electron trajectories and associated Cu K-shell
X-ray generation in pure copper; E 0 = 20 keV.
b Monte Carlo simulation (DTSA-II) of the distribu-
tion of Cu K-shell and L-shell X-rays in a Cu matrix
with E 0 = 10 keV showing the X-rays that escape.
c Monte Carlo simulation (DTSA-II) of the distribu-
tion of Cu K-shell and L-shell X-rays that escape in
Au-1 % Cu with E 0 = 10 keV. d Monte Carlo simula-
tion (DTSA-II) of the distribution of Cu K-shell and
L-shell X-rays that escape in C-1 % Cu with E 0 = 10
keV (Ritchie 2015 ) 1 μm


Cu
Cu K-L 3
E 0 = 20 keV

250 nm

Monte Carlo (DTSA-II) simulation of Cu X-ray production in Cu; E 0 = 10 keV

250 nm

Cu K-L 3 in Cu
E 0 = 10 keV Cu L 3 -M 5 in Cu
E 0 = 10 keV

a

b

Monte Carlo (DTSA-II) simulation of Cu X-ray production in C; E 0 = 10 keV

1 μm 1 μm

Cu K-L 3 in C
E 0 = 10 keV

Cu L 3 -M 5 in C
E 0 = 10 keV

Monte Carlo (DTSA-II) simulation of Cu X-ray production in Au; E 0 = 10 keV

250 nm 250 nm

Cu L 3 -M 5 in Au
E 0 = 10 keV

Cu K-L 3 in Au
E 0 = 10 keV

c

d

Cu K-L3 0.92 mm x 0.92 mm Cu L3-M5 092 mm x 0.92 mm

Cu K-L3 0.54 mm x 0.54 mm Cu L3-M5 0.54 mm x 0.54 mm

Cu K-L3

3.02E-4 Emission 3.1E-3 Emission

8.12E-4 Emission 9.76E-3 Emission

0.089 Emission 1.000 Emission

3.15 mm x 3.15 mm3Cu L3-M5 .15 mm x 3.15 mm

Chapter 4 · X-Rays
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