Scanning Electron Microscopy and X-Ray Microanalysis

155 10

400

300

200

100

0

300 400

X (nm)

Linescan #

0 100 200 500

a

b

∼60 nm

. Fig. 10.10 a Top-down SEM
image of line-width test struc-
tures; E 0 = 15 keV. b Side view of
structures revealed by focused
ion beam milling showing esti-
mated shape from modeling of
the top-down image (red trace)
compared with the edges directly
found in the cross sectional
image (blue) (Villarrubia et al.
2015 )

10.4 · Secondary Electron Contrast at High Spatial Resolution