Scanning Electron Microscopy and X-Ray Microanalysis

(coco) #1

Index


A


Aluminum wire failures 482–483
Anaglyph stereo pair presentation 218
Ancient impact zircons 493
Angular distribution, backscattered
electrons 24–25
Auger electron emission 48
Auger electron spectroscopy 37
Avogadro’s number 4


B


Backscattered electrons (BSEs) 2, 549, vii



  • angular distribution 24–25

  • atomic number contrast 19–20

  • energy distribution 29–30

  • η vs. atomic number, Z 17–19

  • η vs. surface tilt, θ 21–23

  • numerical measure 16

  • origin 16

  • spatial distribution 25–29

  • topographic contrast—number effects 23–24
    Backscattered electron yield data 584–563
    Beam convergence angle, α 80–81
    Beam current 79–80, 214
    Beam current density 80
    Beam diameter 79
    Beam energy 78–79, 297, 330. See also Low
    beam energy SEM; Low beam energy X-ray
    microanalysis

  • compositional contrast with backscattered
    electrons 213

  • high resolution SEM imaging 214

  • vs. secondary electrons (SE) yield 40

  • topographic contrast

    • with backscattered electrons 213

    • with secondary electrons 213
      Beam placement 414
      Beam solid angle 81–83
      Bethe expression 2, 3
      Brightness equation 83
      BSEs. See Backscattered electrons (BSEs)
      Bulk biological and organic specimens 355–356
      Bulk specimens



  • origins of geometric effects 396–397

  • particle analysis

    • optimum spectra 410–414

    • quantitative analysis of particles 415–420

    • uncertainty in 420–422

    • X-ray measurements 408–410

    • X-ray spectrum imaging (XSI) 414–415



  • with rough surfaces 399–401


C


Carbonado diamond 492–493
CASINO simulation 5–7
Cathodoluminescence (CL)



  • applications of

    • geology 492–493

    • materials science 493–495

    • organic compounds 495–497

      • collection of 491

      • detection of 491–492

      • measurement 491

      • origin 490–491
        Compositional mapping

      • limitations of 427–429

      • MAXIMUM PIXEL spectrum 433–435

      • quantitative compositional mapping
        436–441

      • SUM spectrum 431–433

      • total intensity region-of-interest
        mapping 426–427

      • X-ray spectrum imaging (XSI) 429–431

        • EDS dead-time 441–443

        • elemental mapping data collection
          441–450

        • flash mapping 444–445

        • high count mapping 445–450

        • pixel density 443–444

        • pixel dwell time 444–450
          Concentration limit of detection (CDL)



      • reference value 362–363

      • trace or minor constituent 359–362
        Continuous energy loss approximation 2






D
A Database of Electron-Solid Interactions (Joy) 37
Detective quantum efficiency (DQE) 101–103
DTSA-II EDS software


  • design 255

  • fundamental concepts 256–264

  • GUI 267–279

  • Monte Carlo simulation 267

  • motivation 254

  • optional tables 279–283

  • overview 254–255

  • platform 254

  • simulation 264–267

  • three-leg stool

    • experiment design 256

    • quantification 255

    • simulation 255




E
EDS. See Energy dispersive X-ray spectrometry (EDS)
Electron backscattering diffraction (EBSD) xiii


  • align sample 510–511

  • check for EBSD patterns 511–512

  • checklist

    • acquisition parameters 522

    • candidate crystallographic phases 522

    • EBSD detector 521–522

    • microscope operating conditions 522

    • orientation map 522–523

    • pattern optimization 522

    • specimen considerations 521



  • index patterns 508–509

  • map parameters 512

  • measurements 509–510

  • origin of 505–506

  • pattern detection 506–507

    • sample preparation for 510

    • spatial resolution 507–508
      Electron beam, interaction volume change

    • elastic scattering 3–4

    • elastic scattering cross section 4

    • inelastic scattering 2–3

    • Monte Carlo calculations

      • beam electron interaction volume 7–8

      • composition 8–9

      • electron interaction volume 7

      • electron trajectory simulation 4–5

      • incident beam energy 9–10

      • Monte Carlo simulation (CASINO
        simulation) 5–7

      • size of the interaction volume 11–12

      • specimen tilt 10–11



    • specimen atoms 2
      Electron-excited X-ray microanalysis, geometric
      effects 398
      Electron interaction volume 363–364
      Electron optical brightness, β 83
      Electron optical parameters

    • astigmatism 85–87

    • beam convergence angle, α 80–81

    • beam current 79–80

    • beam current density 80

    • beam diameter 79

    • beam energy 78–79

    • beam solid angle 81–83

    • electron optical brightness, β 83

    • focus 83–87
      Electron probe microanalyzers (EPMAs) 91
      Electron–solid interactions, database of 548
      Energy dispersive X-ray microanalysis checklist

    • analytical procedure 477

    • calibrating the EDS detector

      • detector position 473–474

      • energy calibration 472–473

      • probe current 474

      • pulse process time constant 472

      • quality control 473

      • sample orientation 473

      • working distance/pecimen-to-EDS
        distance 473



    • collecting data

      • collecting peak-fitting references 475

      • collecting spectra from unknown
        475–476

      • collecting standards 475

      • experiment optimization 474

      • exploratory spectrum 474

      • reference spectra 475

      • selecting standards 474



    • data analysis 476

    • instrumentation

      • conductive coater 471

      • EDS detector 470–471

      • SEM 470



    • peak reference materials 472

    • quality check 476–477

    • quantification 476

    • results 477

    • sample preparation 471

    • standard materials 472




547 AA–EP

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