Index
A
Aluminum wire failures 482–483
Anaglyph stereo pair presentation 218
Ancient impact zircons 493
Angular distribution, backscattered
electrons 24–25
Auger electron emission 48
Auger electron spectroscopy 37
Avogadro’s number 4
B
Backscattered electrons (BSEs) 2, 549, vii
- angular distribution 24–25
- atomic number contrast 19–20
- energy distribution 29–30
- η vs. atomic number, Z 17–19
- η vs. surface tilt, θ 21–23
- numerical measure 16
- origin 16
- spatial distribution 25–29
- topographic contrast—number effects 23–24
Backscattered electron yield data 584–563
Beam convergence angle, α 80–81
Beam current 79–80, 214
Beam current density 80
Beam diameter 79
Beam energy 78–79, 297, 330. See also Low
beam energy SEM; Low beam energy X-ray
microanalysis - compositional contrast with backscattered
electrons 213 - high resolution SEM imaging 214
- vs. secondary electrons (SE) yield 40
- topographic contrast
- with backscattered electrons 213
- with secondary electrons 213
Beam placement 414
Beam solid angle 81–83
Bethe expression 2, 3
Brightness equation 83
BSEs. See Backscattered electrons (BSEs)
Bulk biological and organic specimens 355–356
Bulk specimens
- origins of geometric effects 396–397
- particle analysis
- optimum spectra 410–414
- quantitative analysis of particles 415–420
- uncertainty in 420–422
- X-ray measurements 408–410
- X-ray spectrum imaging (XSI) 414–415
- with rough surfaces 399–401
C
Carbonado diamond 492–493
CASINO simulation 5–7
Cathodoluminescence (CL)
- applications of
- geology 492–493
- materials science 493–495
- organic compounds 495–497
- collection of 491
- detection of 491–492
- measurement 491
- origin 490–491
Compositional mapping - limitations of 427–429
- MAXIMUM PIXEL spectrum 433–435
- quantitative compositional mapping
436–441 - SUM spectrum 431–433
- total intensity region-of-interest
mapping 426–427 - X-ray spectrum imaging (XSI) 429–431
- EDS dead-time 441–443
- elemental mapping data collection
441–450 - flash mapping 444–445
- high count mapping 445–450
- pixel density 443–444
- pixel dwell time 444–450
Concentration limit of detection (CDL)
- reference value 362–363
- trace or minor constituent 359–362
Continuous energy loss approximation 2
D
A Database of Electron-Solid Interactions (Joy) 37
Detective quantum efficiency (DQE) 101–103
DTSA-II EDS software
- design 255
- fundamental concepts 256–264
- GUI 267–279
- Monte Carlo simulation 267
- motivation 254
- optional tables 279–283
- overview 254–255
- platform 254
- simulation 264–267
- three-leg stool
- experiment design 256
- quantification 255
- simulation 255
E
EDS. See Energy dispersive X-ray spectrometry (EDS)
Electron backscattering diffraction (EBSD) xiii
- align sample 510–511
- check for EBSD patterns 511–512
- checklist
- acquisition parameters 522
- candidate crystallographic phases 522
- EBSD detector 521–522
- microscope operating conditions 522
- orientation map 522–523
- pattern optimization 522
- specimen considerations 521
- index patterns 508–509
- map parameters 512
- measurements 509–510
- origin of 505–506
- pattern detection 506–507
- sample preparation for 510
- spatial resolution 507–508
Electron beam, interaction volume change - elastic scattering 3–4
- elastic scattering cross section 4
- inelastic scattering 2–3
- Monte Carlo calculations
- beam electron interaction volume 7–8
- composition 8–9
- electron interaction volume 7
- electron trajectory simulation 4–5
- incident beam energy 9–10
- Monte Carlo simulation (CASINO
simulation) 5–7 - size of the interaction volume 11–12
- specimen tilt 10–11
- specimen atoms 2
Electron-excited X-ray microanalysis, geometric
effects 398
Electron interaction volume 363–364
Electron optical brightness, β 83
Electron optical parameters - astigmatism 85–87
- beam convergence angle, α 80–81
- beam current 79–80
- beam current density 80
- beam diameter 79
- beam energy 78–79
- beam solid angle 81–83
- electron optical brightness, β 83
- focus 83–87
Electron probe microanalyzers (EPMAs) 91
Electron–solid interactions, database of 548
Energy dispersive X-ray microanalysis checklist - analytical procedure 477
- calibrating the EDS detector
- detector position 473–474
- energy calibration 472–473
- probe current 474
- pulse process time constant 472
- quality control 473
- sample orientation 473
- working distance/pecimen-to-EDS
distance 473
- collecting data
- collecting peak-fitting references 475
- collecting spectra from unknown
475–476 - collecting standards 475
- experiment optimization 474
- exploratory spectrum 474
- reference spectra 475
- selecting standards 474
- data analysis 476
- instrumentation
- conductive coater 471
- EDS detector 470–471
- SEM 470
- peak reference materials 472
- quality check 476–477
- quantification 476
- results 477
- sample preparation 471
- standard materials 472
547 AA–EP