Scanning Electron Microscopy and X-Ray Microanalysis
18 2 energy and lost that energy at a lower initial rate than an elec- tron at a lower incidence energy. Thus, a higher incidenc ...
19 2 CStr=() 21 −SS/ 22 withSS> 1 (2.4) where S is the signal measured at any two locations of interest in the image field. A ...
20 2 2.2.2 BSE Response to Specimen Inclination (η vs. Surface Tilt, θ) Model the effect of the angle of inclination of the spec ...
21 2 . Figure 2.7 shows the results of similar Monte Carlo simulations for various elements as a function of surface inclination ...
22 2 2.2.3 Angular Distribution of Backscattering Beam Incident Perpendicular to the Specimen Surface (0° Tilt) For a flat, bulk ...
23 2 seen in. Fig. 2.9b, with this distribution measured for a tilt of 60° (angle of incidence = 30°). The angular distribution ...
24 2 significant fraction of the Kanaya–Okayama range into the target. Strong elastic scattering materials with high atomic numb ...
25 2 beam energy leads to a strong dependence of the sampling depth of backscattered electrons, as shown in the depth dis- tribu ...
26 2 5 keV 10 keV 20 keV 30 keV . Fig. 2.13 BSE images at various incident beam energies of a semiconductor device consisting of ...
27 2 2.2.5 Energy Distribution of Backscattered Electrons....................................................................... ...
28 2 References Bishop H (1966) Some electron backscattering measurements for solid targets. In: Castaing R, Deschamps P, Philib ...
© Springer Science+Business Media LLC 2018 J. Goldstein et al., Scanning Electron Microscopy and X-Ray Microanalysis, https://do ...
30 3 3.1 Origin Secondary electrons (SE) are created when inelastic scatter- ing of the beam electrons ejects weakly bound valen ...
31 3 Koshikawa & Shimizu (1973) data Secondary electron energy spectrum for Cu (E 0 = 1 keV) 500 400 300 200 N(E) (arbitrary ...
32 3 Koshikawa & Shimizu (1974) Monte Carlo calculation Secondary electron escape depth for Cu 1.0 a b 0.8 0.6 0.4 0.2 0.0 0 ...
33 3 Secondary electron escape depth Kanaya-Ono (1984) calculations Li K Na 10 8 6 4 2 0 02040 Atomic number 60 80 Escape depth ...
34 3 3.5 Secondary Electron Yield Versus Specimen Tilt When the secondary electron coefficient is measured as a function of the ...
35 3 secondary electrons is expected to follow a cosine relation with the emergence angle relative to the local surface nor- mal ...
36 3 Secondary electron yield vs. beam energy for copper Secondary electron coefficient Moncrieff and Barker (1976) a 0.8 0.7 0. ...
37 3 other surface for specimens with more complex topography than a simple flat bulk target), the SE that they continue to gen- ...
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