Scanning Electron Microscopy and X-Ray Microanalysis
143 9 dose (15 min of bombardment at 20 keV and 10 nA), a much less significant collapse crater is seen to have formed. It is ...
14 4 9 in. Fig. 9.16, which shows contamination in scanned areas on a patterned silicon sample used for dimensional metrol- ogy ...
145 9 the two patterns. The form of the moiré interference fringes depends on the spacing and orientation of the specimen period ...
14 6 9 References Hren J (1986) Barriers to AEM: contamination and etching. In: Joy D, Romig A, Goldstein J (eds) Principles of ...
© Springer Science+Business Media LLC 2018 J. Goldstein et al., Scanning Electron Microscopy and X-Ray Microanalysis, https://do ...
14 8 10 10.1 What Is “High Resolution SEM Imaging”? “I know high resolution when I see it, but sometimes it doesn’t seem to be a ...
149 10 energy and composition dependent.. Table 10.2 gives the diameter of the footprint of the area that contains 90 % of the B ...
150 10 biased Everhart–Thornley (E–T) detector collects a complex mixture of BSE and SE signals, including a large BSE compo- ne ...
151 10 and 10°. Superimposed on this broad scale secondary elec- tron topographic contrast are strong sources of contrast associ ...
152 10 excess of SEs compared to the bulk interior. In addition, there will be enhanced escape of BSEs near the edge, and these ...
153 10 structure, but these energetic BSEs will continue to travel, backscattering off other nearby specimen surfaces and the SE ...
15 4 10 shown in. Fig. 10.5b. While the object will appear in high contrast as a very bright feature against the background, mak ...
155 10 400 300 200 100 0 300 400 X (nm) Linescan # 0 100 200 500 a b ∼60 nm . Fig. 10.10 a Top-down SEM image of line-width test ...
156 10 10 High Resolution Imaging with Secondary Electrons Type 1 secondary electrons (SE 1 ), which are generated within the fo ...
157 10 energy is reduced so that E 0 ≤ 2 keV, the situation illustrated in. Fig. 10.11b is reached for a finely focused beam (Jo ...
158 10 a background noise component that, while it reduces the overall signal-to-noise, does not significantly alter the signal ...
159 10 is applied (. Fig. 10.14b), the SE signal at the edges of fea- tures will be substantially enhanced. Making Fewer BSEs, S ...
160 10 (K411 glass) in. Fig. 10.16. By selecting operation at the high- est beam energy available, for example, 20–30 keV, backs ...
161 10 A simple STEM-in-SEM bright-field detector can be created as shown in. Fig. 10.18. The grid carrying the thin specimen is ...
162 10 energy, for example, E 0 ≥ 10 keV. However, high resolution SEM can be achieved by eliminating the use of SEs as the im ...
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